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  1. 000 Research Domain
  2. 005 Department of Electronics and Manufacturing
  3. 00501 Research Data

NbO2薄膜の抵抗率温度依存性

https://doi.org/10.50886/0002003409
https://doi.org/10.50886/0002003409
8a36ac54-e8c9-4569-b65a-3c1fd9b2b372
Name / File License Actions
Fig3_data.txt Fig3_data.txt (11 KB)
license.icon
Item type Research Data v10(1)
PubDate 2025-12-10
Data name
Title NbO2薄膜の抵抗率温度依存性
Language ja
Description of data
Description Type Abstract
Description AIP Advances 12, 055103 (2022)のFIG. 3の元データ
Language ja
Author (Creator) name Shibuya, Keisuke

× Shibuya, Keisuke (代表作成者)

ORCID 0000-0001-5067-5952

ja 渋谷, 圭介(Personal)
産業技術総合研究所

en Shibuya, Keisuke(Personal)
National Institute of Advanced Industrial Science and Technology (AIST)

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Terms of Use
Rights Resource https://creativecommons.org/licenses/by-nc-nd/4.0/deed.en
Rights Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International
Language en
Terms of Use
Rights 学会誌等の投稿規程に記載の引用方法に従うこと
Language ja
Keyword
Language ja
Subject Scheme Other
Subject 無機デバイス関連材料
Keyword
Language en
Subject Scheme Other
Subject Inorganic device-related materials
Publisher
Publisher 産業技術総合研究所
Language ja
Date
Date 2025-12-10
Date Type Issued
Language
Language jpn
Resource Type
Resource Type Identifier http://purl.org/coar/resource_type/c_ddb1
Resource Type dataset
Identifier Registration
Identifier Registration 10.50886/0002003409
Identifier Registration Type JaLC
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