WEKO3
Item
Monitoring of inner wall condition in mass-production plasma etching process using a load impedance monitoring system
https://aist.repo.nii.ac.jp/records/2001941
https://aist.repo.nii.ac.jp/records/2001941d9053e95-9c11-42b6-9757-72b77c0db12d
| Item type | Research Data (v9)(1) | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| PubDate | 2015-01-01 | |||||||||||||||
| Data name | ||||||||||||||||
| Title | Monitoring of inner wall condition in mass-production plasma etching process using a load impedance monitoring system | |||||||||||||||
| Language | en | |||||||||||||||
| Description of data | ||||||||||||||||
| Description Type | Abstract | |||||||||||||||
| Description | This work describes the detection of changes in the inner wall condition of mass-production plasma etching equipment by a load impedance monitoring system. The system detects the change in the imaginary part of the load impedance from a 50 ohm transmission line when the inner wall condition is changed by exposure to the atmosphere. The results demonstrate that the system can be used as a novel method for real-time and noninvasive monitoring of the wall condition of etching chambers. This method will contribute to improvements in production yield and overall equipment effectiveness, and the development of predictive maintenance in semiconductor manufacturing. | |||||||||||||||
| Language | en | |||||||||||||||
| Author (Creator) name |
笠嶋 悠司
× 笠嶋 悠司
× 栗田 裕之
× 木村 直也
× 安藤 晃
× 上杉 文彦
|
|||||||||||||||
| Access Rights | ||||||||||||||||
| Access Rights | open access | |||||||||||||||
| Access Rights URI | http://purl.org/coar/access_right/c_abf2 | |||||||||||||||
| APC | ||||||||||||||||
| APC | Not required | |||||||||||||||
| Rights Holder | ||||||||||||||||
| Right Holder Name | 笠嶋 悠司 | |||||||||||||||
| Language | en | |||||||||||||||
| Publisher | ||||||||||||||||
| Publisher | IOP PUBLISHING LTD | |||||||||||||||
| Language | en | |||||||||||||||
| Date | ||||||||||||||||
| Date | 2015-01-01 | |||||||||||||||
| Date Type | Issued | |||||||||||||||
| Language | ||||||||||||||||
| Language | eng | |||||||||||||||
| Resource Type | ||||||||||||||||
| Resource Type Identifier | http://purl.org/coar/resource_type/c_6501 | |||||||||||||||
| Resource Type | journal article | |||||||||||||||
| Identifier | ||||||||||||||||
| Identifier | 10.7567/JJAP.54.060301 | |||||||||||||||
| Identifier Type | DOI | |||||||||||||||
| Relation | ||||||||||||||||
| Relation Type | isVersionOf | |||||||||||||||
| Identifier Type | URI | |||||||||||||||
| Related Identifier | http://iopscience.iop.org/article/10.7567/JJAP.54.060301/meta | |||||||||||||||
| Language | ja | |||||||||||||||
| Related Title | 関連 URI | |||||||||||||||
| Source Title | ||||||||||||||||
| Source Title | JAPANESE JOURNAL OF APPLIED PHYSICS | |||||||||||||||
| Language | en | |||||||||||||||
| Volume Number | ||||||||||||||||
| Volume | 54 | |||||||||||||||
| Page Start | ||||||||||||||||
| Start Page | 060301_1 | |||||||||||||||
| Page End | ||||||||||||||||
| End Page | 060301_4 | |||||||||||||||
