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High-Resolution Microfabrication Process in Half-pipe Substrate for 3D Photolithography Application

https://aist.repo.nii.ac.jp/records/2001770
https://aist.repo.nii.ac.jp/records/2001770
941f363c-ff54-44df-a4ec-842696fd233e
Item type Research Data (v9)(1)
PubDate 2014-01-01
Data name
Title High-Resolution Microfabrication Process in Half-pipe Substrate for 3D Photolithography Application
Language ja
Description of data
Description Type Abstract
Description We have successfully established a new fabrication process for preparing fine patterns in a half-pipe substrate and then fabricating 3D mask module. Using the as-prepared half-pipe 3D mask module, high efficiency photolithography process could be directly realized on tiny fibres. Therefore, more interesting applications could be developed further in E-textile industry.
Language ja
Author (Creator) name 二階堂 景

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ja 二階堂 景
二階堂 景

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林 政寛

× 林 政寛

ja 林 政寛
林 政寛

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張 毅

× 張 毅

ja 張 毅
張 毅

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早瀬 仁則

× 早瀬 仁則

ja 早瀬 仁則
早瀬 仁則

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伊藤 寿浩

× 伊藤 寿浩

ja 伊藤 寿浩
伊藤 寿浩

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Access Rights
Access Rights open access
Access Rights URI http://purl.org/coar/access_right/c_abf2
APC
APC Not required
Rights Holder
Right Holder Name 二階堂 景
Language ja
Publisher
Publisher The Japan Society of Applied Physics
Language ja
Date
Date 2014-01-01
Date Type Issued
Language
Language jpn
Resource Type
Resource Type Identifier http://purl.org/coar/resource_type/c_6501
Resource Type journal article
Source Title
Source Title Proceedings of MNC2014
Language ja
Page Start
Start Page 20pm3_ps21
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